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Development of Dry Film Photoresist for a Digital Imaging System Masanobu TAKASHIMA , Morimasa SATOU , Kazumori MINAMI , Shinichiro SERIZAWA , and Yoshiharu SASAKI Abstract An H-line Dry Film Photoresist.

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Dry film is a polyester film coated with a polymer which is sensitive to ultraviolet light (Photoresist). It adheres by heat to the PCB and allows you to print circuits using any photolithography method. Once photosensitized, it is developed using an alkaline solution.

Global photoresist market is long monopolized by Japanese and American companies, with the top five players alone commanding a whopping 87% of the highly concentrated market. Four Japanese companies, JSR, Tokyo Ohka Kogyo, Shin-Etsu Chemical and Fujifilm Electronic Materials, take a combined 72.5% share.

DuPont's robust, production-proven photoresist product line offers materials options that meet the requirements across generations of lithography processes.

DuPont™ Riston® dry film photoresist revolutionized the way printed circuit boards were fabricated when it was invented by DuPont 40 years ago. The original dry film photoresist invented by DuPont is the industry standard for high yield, productivity, and ease of use in all imaging applications.

Photoresist Manufacturers AZ Electronic Material (Merck KGaA)DowDuPontDJ MicroLaminatesElectra Polymers Ltd.Eternal ChemicalFujifilm Electronic MaterialsHitachi ChemicalHiTech Photopolymere AGJSR MicroKolon IndustriesMacDermidKayaku Advanced MaterialsSumitomo ChemicalTokyo Ohka Kogyo Co., Ltd.

Dry film processing transfers digital information to film using heat or a combination of heat and light, and the images are processed by the films themselves.

Dry Film is a photo-resist, when strong UV light hits it, where the light hits, it hardens and this hardened form resists etching solutions. The film is comprised of three parts, the blue layer is in the middle, this is the polymer which hardens with UV, on each side of this polymer is a protective transparent film.

3 Photoresists. Photoresists are fundamental materials related to photolithography. They are light-sensitive materials, composed of a polymer, a sensitizer, and a solvent.

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© Copyright 1997-2025
airSlate Legal Forms, Inc.
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Form Packages
Adoption
Bankruptcy
Contractors
Divorce
Home Sales
Employment
Identity Theft
Incorporation
Landlord Tenant
Living Trust
Name Change
Personal Planning
Small Business
Wills & Estates
Packages A-Z
Form Categories
Affidavits
Bankruptcy
Bill of Sale
Corporate - LLC
Divorce
Employment
Identity Theft
Internet Technology
Landlord Tenant
Living Wills
Name Change
Power of Attorney
Real Estate
Small Estates
Wills
All Forms
Forms A-Z
Form Library
Customer Service
Terms of Service
Privacy Notice
Legal Hub
Content Takedown Policy
Bug Bounty Program
About Us
Help Portal
Legal Resources
Blog
Affiliates
Contact Us
Delete My Account
Site Map
Industries
Forms in Spanish
Localized Forms
State-specific Forms
Forms Kit
Legal Guides
Real Estate Handbook
All Guides
Prepared for You
Notarize
Incorporation services
Our Customers
For Consumers
For Small Business
For Attorneys
Our Sites
US Legal Forms
USLegal
FormsPass
pdfFiller
signNow
airSlate WorkFlow
DocHub
Instapage
Social Media
Call us now toll free:
+1 833 426 79 33
As seen in:
  • USA Today logo picture
  • CBC News logo picture
  • LA Times logo picture
  • The Washington Post logo picture
  • AP logo picture
  • Forbes logo picture
© Copyright 1997-2025
airSlate Legal Forms, Inc.
3720 Flowood Dr, Flowood, Mississippi 39232