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Irene and V. A. Yakovlev* Department of Chemistry University of North Carolina at Chapel Hill Chapel Hill, NC 27599-3290 *Institute of Crystallography, Acad. of Sci., Leninsky pr. 59 Moscow, 117333 RUSSIA Presented at Second Symposium on Chemistry and Physics of SiO 2 and Si-SiO 2 Interface and to be Published 1993 in Symposium Volume. July 13, 1992 S TIQ Reproduction in whole or in part is permitted for any purpose of the United States Government. This document has been approved for public.

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